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This article is cited in 3 scientific papers (total in 3 papers)
Brief Communications
High-optical-strength thin-film interference polarizers for high-power lasers
N. I. Gavrilov, P. P. Pashinin, A. M. Prokhorov, O. M. Prilyuk, S. N. Sergeev, R. V. Serov, Sh. A. Furman, V. P. Yanovskiĭ, V. D. Vvedenskiĭ P. N. Lebedev Physical Institute, the USSR Academy of Sciences, Moscow
Abstract:
Thin-film interference polarizers made of SiO2 and ZrO2 layers were made and investigated. The technology of deposition of the layers is described. The results are reported of an investigation of the optical strength of such polarizers and the mechanism of damage is considered. It is shown that the investigated polarizers are suitable for use in high-power laser systems.
Received: 19.11.1982
Citation:
N. I. Gavrilov, P. P. Pashinin, A. M. Prokhorov, O. M. Prilyuk, S. N. Sergeev, R. V. Serov, Sh. A. Furman, V. P. Yanovskiĭ, V. D. Vvedenskiĭ, “High-optical-strength thin-film interference polarizers for high-power lasers”, Kvantovaya Elektronika, 10:9 (1983), 1914–1916 [Sov J Quantum Electron, 13:9 (1983), 1272–1273]
Linking options:
https://www.mathnet.ru/eng/qe4696 https://www.mathnet.ru/eng/qe/v10/i9/p1914
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Abstract page: | 219 | Full-text PDF : | 101 | First page: | 1 |
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