Investigation of lasing in lead vapor by the double pulse method

The double pulse method was to study the 722.9 nm line emitted by a lead vapor laser. The parameters of the second excitation pulse were measured simultaneously with the lasing characteristics. It was found that the main factor determining a decrease in the laser output power in the second pulse was the residual population of the lower active level. Variations in the excitation pulse had a relatively weak influence on the form of this dependence and were essentially manifested when there was a relatively long delay between the excitation pulses.