I. A. Artyukov, L. L. Balakireva, F. Bijkerk, A. V. Vinogradov, N. N. Zorev, I. V. Kozhevnikov, V. V. Kondratenko, O. F. Ogurtsov, A. G. Ponomarenko, A. I. Fedorenko, “Projection x-ray lithography implemented using point sources”, Kvantovaya Elektronika, 19:2 (1992), 114–127 [Sov J Quantum Electron, 22:2 (1992), 99

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Kvantovaya Elektronika, 1992, Volume 19, Number 2, Pages 114–127 (Mi qe3351)

This article is cited in 4 scientific papers (total in 4 papers)

Review

Projection x-ray lithography implemented using point sources

I. A. Artyukov, L. L. Balakireva, F. Bijkerk, A. V. Vinogradov, N. N. Zorev, I. V. Kozhevnikov, V. V. Kondratenko, O. F. Ogurtsov, A. G. Ponomarenko, A. I. Fedorenko

Full-text PDF (3567 kB) Citations (4)

Abstract: An analysis is made of the state of the art of x-ray lithography and x-ray optics. The principles of design and configurations of projection x-ray lithographic systems are considered. An analysis is made of the main trends of research on these topics proceeding in the laboratories in the Soviet Union, USA, Japan, and Great Britain. The problems encountered in the development of multilayer normal-incidence x-ray mirrors are described.

Received: 20.06.1991

English version:
Soviet Journal of Quantum Electronics, 1992, Volume 22, Issue 2, Pages 99–110
DOI: https://doi.org/10.1070/QE1992v022n02ABEH003351

Bibliographic databases:

Document Type: Article

UDC: 778.33:776

PACS: 41.50.+h, 42.82.Cr, 42.79.Bh

Language: Russian

Citation: I. A. Artyukov, L. L. Balakireva, F. Bijkerk, A. V. Vinogradov, N. N. Zorev, I. V. Kozhevnikov, V. V. Kondratenko, O. F. Ogurtsov, A. G. Ponomarenko, A. I. Fedorenko, “Projection x-ray lithography implemented using point sources”, Kvantovaya Elektronika, 19:2 (1992), 114–127 [Sov J Quantum Electron, 22:2 (1992), 99–110]

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https://www.mathnet.ru/eng/qe3351

https://www.mathnet.ru/eng/qe/v19/i2/p114

This publication is cited in the following 4 articles:

Citing articles in Google Scholar: Russian citations, English citations
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