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This article is cited in 3 scientific papers (total in 3 papers)
Laser applications and other topics in quantum electronics
Binary phase masks on self-developing photopolymers: the technique for formation and testing in an optical correlator
P. V. Yezhov, O. A. Il'in, T. N. Smirnova, E. A. Tikhonov Institute of Physics, National Academy of Sciences of Ukraine, Kiev
Abstract:
Binary phase masks (PMs) of size 256×256 cells with a random distribution of elements, formed on the self-developing FPK-488 photopolymer, are studied. The masks were prepared by the projection method using amplitude transparencies. The phase shift between the mask elements corresponding to the regions of the amplitude transparency with the optical density D = 0 and 2 was (0.85 ± 0.05)π at the wavelength of 0.633 μm. Holographic matched filters were recorded for PMs obtained. The diffraction efficiency of holographic matched PM filters was 40 %. The signal-to-noise ratio for recognition signals for PMs in the Vander Lugt correlator was 20 dB. The normalised power density of the recognition signal is studied as a function of the rotation angle of a PM in the input plane of the Vander Lugt correlator.
Received: 04.06.2002
Citation:
P. V. Yezhov, O. A. Il'in, T. N. Smirnova, E. A. Tikhonov, “Binary phase masks on self-developing photopolymers: the technique for formation and testing in an optical correlator”, Kvantovaya Elektronika, 33:6 (2003), 559–562 [Quantum Electron., 33:6 (2003), 559–562]
Linking options:
https://www.mathnet.ru/eng/qe2457 https://www.mathnet.ru/eng/qe/v33/i6/p559
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Abstract page: | 120 | Full-text PDF : | 103 | First page: | 1 |
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