Abstract:
The results of investigation of a capillary discharge plasma, used as a source of intense VUV radiation and soft X-rays, are presented. The plasma was generated during the discharge of low-inductance condensers in a gas-filled ceramic capillary. Intense line radiation was observed in a broad spectral range (30-400 Å) in various gases (CO2, Ne, Ar, Kr, Xe). The absolute radiation yield for the xenon discharge was ~5 mJ (2π sr)-1 pulse-1 within a spectral band of width 9 Å at 135 Å. Such a radiation source can be used for various practical applications, such as EUV projection lithography, microscopy of biological objects in a 'water window', reflectometry, etc.
Citation:
I. I. Sobel'man, A. P. Shevel'ko, O. F. Yakushev, L. V. Knight, R. S. Turley, “A capillary discharge plasma source of intense VUV radiation”, Kvantovaya Elektronika, 33:1 (2003), 3–6 [Quantum Electron., 33:1 (2003), 3–6]
Linking options:
https://www.mathnet.ru/eng/qe2357
https://www.mathnet.ru/eng/qe/v33/i1/p3
This publication is cited in the following 12 articles: