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Kvantovaya Elektronika, 2003, Volume 33, Number 1, Pages 3–6 (Mi qe2357)  

This article is cited in 11 scientific papers (total in 11 papers)

Special issue devoted to the 80th anniversary of academician N. G. Basov's birth

A capillary discharge plasma source of intense VUV radiation

I. I. Sobel'mana, A. P. Shevel'koa, O. F. Yakusheva, L. V. Knightb, R. S. Turleyb

a P. N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow
b Brigham Young University, USA
Abstract: The results of investigation of a capillary discharge plasma, used as a source of intense VUV radiation and soft X-rays, are presented. The plasma was generated during the discharge of low-inductance condensers in a gas-filled ceramic capillary. Intense line radiation was observed in a broad spectral range (30-400 Å) in various gases (CO2, Ne, Ar, Kr, Xe). The absolute radiation yield for the xenon discharge was ~5 mJ (2π sr)-1 pulse-1 within a spectral band of width 9 Å at 135 Å. Such a radiation source can be used for various practical applications, such as EUV projection lithography, microscopy of biological objects in a 'water window', reflectometry, etc.
Received: 17.06.2002
English version:
Quantum Electronics, 2003, Volume 33, Issue 1, Pages 3–6
DOI: https://doi.org/10.1070/QE2003v033n01ABEH002357
Bibliographic databases:
Document Type: Article
PACS: 52.25.Os, 52.50.Nr, 42.72.Bj
Language: Russian


Citation: I. I. Sobel'man, A. P. Shevel'ko, O. F. Yakushev, L. V. Knight, R. S. Turley, “A capillary discharge plasma source of intense VUV radiation”, Kvantovaya Elektronika, 33:1 (2003), 3–6 [Quantum Electron., 33:1 (2003), 3–6]
Linking options:
  • https://www.mathnet.ru/eng/qe2357
  • https://www.mathnet.ru/eng/qe/v33/i1/p3
  • This publication is cited in the following 11 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Квантовая электроника Quantum Electronics
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