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This article is cited in 1 scientific paper (total in 1 paper)
Special issue dedicated to the 100th anniversary of the birth of N.G.Basov
Optical and X-ray microlithography at the turn of the century
I. A. Artyukov P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow
Abstract:
The paper reviews the development of optical lithography based on excimer laser and soft X-ray projection lithography at the end of the 20th century and at the beginning of the 21th century. The contribution of N.G. Basov and his colleagues in this field at FIAN and MEPhI is described.
Keywords:
optical lithography, soft X-ray projection lithography, soft X-rays, X-ray multilayer optics, EUV lithography.
Received: 16.09.2022 Revised: 08.12.2022
Citation:
I. A. Artyukov, “Optical and X-ray microlithography at the turn of the century”, Kvantovaya Elektronika, 52:12 (2022), 1094–1101 [Bull. Lebedev Physics Institute, 50:suppl. 4 (2023), S426–S434]
Linking options:
https://www.mathnet.ru/eng/qe18141 https://www.mathnet.ru/eng/qe/v52/i12/p1094
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Abstract page: | 105 | References: | 24 | First page: | 21 |
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