Effect of the thickness of the passivating reactive titanium layer of mirror facets on the electrical characteristics of diode lasers

A method is described for determining an allowable thickness of a titanium layer for passivating emitting faces of a diode laser. Reactive metal passivation is easily integrated into the manufacturing process of diode lasers. Titanium is chosen as a reactive metal, since it serves as an adhesive layer of ohmic contacts of semiconductor structures. It is shown that when the layer of deposited titanium decreases from 4.3 to 0.7 nm, the shape of the I–V curve of the diode laser tends to that before the coating deposition.