A. M. Chaplanov, A. N. Shibko, “Effect of polarised laser radiation on the oxidation of titanium films upon thermal annealing”, Kvantovaya Elektronika, 30:6 (2000), 532–534 [Quantum Electron., 30:6 (2000), 532

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Kvantovaya Elektronika, 2000, Volume 30, Number 6, Pages 532–534 (Mi qe1759)

This article is cited in 1 scientific paper (total in 1 paper)

Interaction of laser radiation with matter. Laser plasma

Effect of polarised laser radiation on the oxidation of titanium films upon thermal annealing

A. M. Chaplanov, A. N. Shibko

Institute of Electronics, National Academy of Sciences of Belarus, Minsk

Full-text PDF (188 kB) Citations (1)

Abstract: The effect of laser irradiation of heated Ti films on their phase composition is studied. The exposure of Ti films to a beam of linearly polarised 1.96-eV photons during their annealing in vacuum was found to suppress the oxidation reaction.

Received: 14.01.1999

English version:
Quantum Electronics, 2000, Volume 30, Issue 6, Pages 532–534
DOI: https://doi.org/10.1070/QE2000v030n06ABEH001759

Bibliographic databases:

Document Type: Article

PACS: 81.40.Ef, 68.55.Nq, 61.80.Ba

Language: Russian

Citation: A. M. Chaplanov, A. N. Shibko, “Effect of polarised laser radiation on the oxidation of titanium films upon thermal annealing”, Kvantovaya Elektronika, 30:6 (2000), 532–534 [Quantum Electron., 30:6 (2000), 532–534]

Linking options:

https://www.mathnet.ru/eng/qe1759

https://www.mathnet.ru/eng/qe/v30/i6/p532

This publication is cited in the following 1 articles:

Citing articles in Google Scholar: Russian citations, English citations
Related articles in Google Scholar: Russian articles, English articles

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