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This article is cited in 11 scientific papers (total in 11 papers)
X-ray spectrometry
Flat-field VLS spectrometer for a wavelength range of 50–275 Å
A. O. Kolesnikov, E. A. Vishnyakov, A. N. Shatokhin, E. N. Ragozin P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow
Abstract:
A flat-field VLS spectrograph for a wavelength range ~50 – 275 Å with an average linear dispersion of 0.18 mm Å-1, which makes use of a grazing-incidence varied line-space (VLS) grating, was calculated and implemented (a spectrograph of Harada class). To fabricate the VLS grating by interference lithography technique, an algorithm was developed for calculating the writing configuration with an auxiliary aberrating mirror (the solution of the inverse problem of interference lithography). The spectrograph was put to a test and line spectra were recorded from the laser-produced plasma of lithium fluoride and teflon targets, which were excited by a focused laser beam (0.5 J, 8 ns, 1.06 μm). A resolving power λ/σ λ = 800 was demonstrated in a wavelength region of 135 Å.
Keywords:
soft X-rays, flat-field spectrograph, laser plasma, spherical VLS grating, interference lithography.
Received: 10.06.2019 Revised: 25.07.2019
Citation:
A. O. Kolesnikov, E. A. Vishnyakov, A. N. Shatokhin, E. N. Ragozin, “Flat-field VLS spectrometer for a wavelength range of 50–275 Å”, Kvantovaya Elektronika, 49:11 (2019), 1054–1058 [Quantum Electron., 49:11 (2019), 1054–1058]
Linking options:
https://www.mathnet.ru/eng/qe17142 https://www.mathnet.ru/eng/qe/v49/i11/p1054
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Abstract page: | 213 | Full-text PDF : | 133 | References: | 30 | First page: | 10 |
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