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This article is cited in 4 scientific papers (total in 4 papers)
Extreme light fields and their applications
Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer
D. A. Zayarnyia, A. A. Ionina, S. I. Kudryashovab, S. V. Makarovac, A. A. Rudenkoa, E. A. Drozdovad, S. B. Odinokovd a P. N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow
b National Engineering Physics Institute "MEPhI", Moscow
c St. Petersburg State University of Information Technologies, Mechanics and Optics
d Bauman Moscow State Technical University
Abstract:
Specific features of ablation of a thin silver film with a 1-$\mu$m-thick layer of a highly transparent photoresist and the same film without a photoresist layer under single tightly focused femtosecond laser pulses in the visible range (515 nm) are experimentally investigated. Interference effects of internal modification of the photoresist layer, its spallation ablation from the film surface and formation of through hollow submicron channels in the resist without its spallation but with ablation of the silver film lying under the resist are found and discussed.
Keywords:
thin silver film with a micron-thick layer of a transparent photoresist, femtosecond laser pulses in the visible range, tight focusing, submicron and micron ablation.
Received: 22.02.2015
Citation:
D. A. Zayarnyi, A. A. Ionin, S. I. Kudryashov, S. V. Makarov, A. A. Rudenko, E. A. Drozdova, S. B. Odinokov, “Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer”, Kvantovaya Elektronika, 45:5 (2015), 462–466 [Quantum Electron., 45:5 (2015), 462–466]
Linking options:
https://www.mathnet.ru/eng/qe16177 https://www.mathnet.ru/eng/qe/v45/i5/p462
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Abstract page: | 249 | Full-text PDF : | 54 | References: | 24 | First page: | 15 |
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