Freestanding film structures for laser plasma experiments

The technique is developed for fabricating 5—500-nm-thick freestanding films of various materials and multilayer compositions. Apart from the traditional use in spectral filtration of soft X-ray and extreme ultraviolet radiation, the possibility of using the ultrathin films fabricated by this technique as targets in experiments on laser acceleration of ions is considered. A sample of the target in the form of a 5-nm-thick carbon film on a supporting net is fabricated.