Abstract:
Characteristics of a discharge-produced plasma (DPP) light source in the spectral band 13.5±0.135 nm, developed for Extreme Ultra Violet (EUV) lithography, are presented. EUV light is generated by DPP in tin vapour formed between rotating disk electrodes. The discharge is ignited by a focused laser beam. The EUV power 1000 W/(2π sr) in the spectral band 13.5±0.135 nm was achieved with input power about of ~63 kW to the plasma at a pulse repetition rate ~7 kHz. The results of numerical simulation are compared with the experimental data.
Citation:
V. M. Borisov, G. N. Borisova, A. Yu. Vinokhodov, S. V. Zakharov, A. S. Ivanov, Yu. B. Kiryukhin, V. A. Mishchenko, A. V. Prokof'ev, O. B. Khristoforov, “High-power EUV (13.5 nm) light source”, Kvantovaya Elektronika, 40:8 (2010), 720–726 [Quantum Electron., 40:8 (2010), 720–726]
Linking options:
https://www.mathnet.ru/eng/qe14369
https://www.mathnet.ru/eng/qe/v40/i8/p720
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