|
This article is cited in 10 scientific papers (total in 10 papers)
Interaction of laser radiation with matter. Laser plasma
High-power EUV (13.5 nm) light source
V. M. Borisov, G. N. Borisova, A. Yu. Vinokhodov, S. V. Zakharov, A. S. Ivanov, Yu. B. Kiryukhin, V. A. Mishchenko, A. V. Prokof'ev, O. B. Khristoforov State Research Center of Russian Federation "Troitsk Institute for Innovation and Fusion Research"
Abstract:
Characteristics of a discharge-produced plasma (DPP) light source in the spectral band 13.5±0.135 nm, developed for Extreme Ultra Violet (EUV) lithography, are presented. EUV light is generated by DPP in tin vapour formed between rotating disk electrodes. The discharge is ignited by a focused laser beam. The EUV power 1000 W/(2π sr) in the spectral band 13.5±0.135 nm was achieved with input power about of ~63 kW to the plasma at a pulse repetition rate ~7 kHz. The results of numerical simulation are compared with the experimental data.
Received: 26.05.2010
Citation:
V. M. Borisov, G. N. Borisova, A. Yu. Vinokhodov, S. V. Zakharov, A. S. Ivanov, Yu. B. Kiryukhin, V. A. Mishchenko, A. V. Prokof'ev, O. B. Khristoforov, “High-power EUV (13.5 nm) light source”, Kvantovaya Elektronika, 40:8 (2010), 720–726 [Quantum Electron., 40:8 (2010), 720–726]
Linking options:
https://www.mathnet.ru/eng/qe14369 https://www.mathnet.ru/eng/qe/v40/i8/p720
|
Statistics & downloads: |
Abstract page: | 311 | Full-text PDF : | 252 | References: | 44 | First page: | 1 |
|