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Kvantovaya Elektronika, 2010, Volume 40, Number 8, Pages 720–726 (Mi qe14369)  
This article is cited in 10 scientific papers (total in 10 papers)

Interaction of laser radiation with matter. Laser plasma

High-power EUV (13.5 nm) light source

V. M. Borisov, G. N. Borisova, A. Yu. Vinokhodov, S. V. Zakharov, A. S. Ivanov, Yu. B. Kiryukhin, V. A. Mishchenko, A. V. Prokof'ev, O. B. Khristoforov

State Research Center of Russian Federation "Troitsk Institute for Innovation and Fusion Research"
Full-text PDF (1053 kB) Citations (10)
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Abstract: Characteristics of a discharge-produced plasma (DPP) light source in the spectral band 13.5±0.135 nm, developed for Extreme Ultra Violet (EUV) lithography, are presented. EUV light is generated by DPP in tin vapour formed between rotating disk electrodes. The discharge is ignited by a focused laser beam. The EUV power 1000 W/(2π sr) in the spectral band 13.5±0.135 nm was achieved with input power about of ~63 kW to the plasma at a pulse repetition rate ~7 kHz. The results of numerical simulation are compared with the experimental data.
Received: 26.05.2010
English version:
Quantum Electronics, 2010, Volume 40, Issue 8, Pages 720–726
DOI: https://doi.org/10.1070/QE2010v040n08ABEH014369
Bibliographic databases:
Document Type: Article
PACS: 42.72.Bj, 52.80.-s, 52.50.Jm
Language: Russian


Citation: V. M. Borisov, G. N. Borisova, A. Yu. Vinokhodov, S. V. Zakharov, A. S. Ivanov, Yu. B. Kiryukhin, V. A. Mishchenko, A. V. Prokof'ev, O. B. Khristoforov, “High-power EUV (13.5 nm) light source”, Kvantovaya Elektronika, 40:8 (2010), 720–726 [Quantum Electron., 40:8 (2010), 720–726]
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  • https://www.mathnet.ru/eng/qe/v40/i8/p720
    • This publication is cited in the following 10 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    		Квантовая электроника Quantum Electronics
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    Full-text PDF :252
    References:44
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