Defects of a phosphosilicate glass exposed to the 193-nm radiation

Induced absorption is measured in a hydrogen-unloaded phosphosilicate glass (PSG) in spectral ranges from 140 to 850 nm and from 1000 to 1700 nm before and after its exposure to the 193-nm radiation. It is shown that the induced-absorption bands in the range between 140 and 300 nm do not coincide with the bands observed earlier after exposing a PSG to X-rays. It is assumed that the photorefractive effect in the PSG is related to variations induced in the glass network rather than to defects responsible for the induced-absorption bands.