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Kvantovaya Elektronika, 1982, Volume 9, Number 3, Pages 625–628 (Mi qe12202)  

Brief Communications

Investigation of a chemical HF laser utilizing a highpressure H2–SF6 mixture

A. S. Bashkin, A. N. Oraevsky, V. N. Tomashov, N. N. Yuryshev
Abstract: An investigation was made of the energy characteristics of a chemical HF laser utilizing an H2–SF6 mixture and excited by a beam of relativistic electrons. Efficient lasing was obtained at gas mixture pressures up to 4.5 atm, a specific output energy of 50 J/liter being obtained at 1.5 atm. It should be possible to tune continuously the lasing frequency in a range 2.2 cm–1 centered on each vibrational-rotational line and thus build a highpower tunable laser of the kind required in laser-chemical investigations.
Received: 07.07.1981
English version:
Soviet Journal of Quantum Electronics, 1982, Volume 12, Issue 3, Pages 384–387
DOI: https://doi.org/10.1070/QE1982v012n03ABEH012202
Bibliographic databases:
Document Type: Article
UDC: 621.373.826.038.823
PACS: 42.55.Ks
Language: Russian


Citation: A. S. Bashkin, A. N. Oraevsky, V. N. Tomashov, N. N. Yuryshev, “Investigation of a chemical HF laser utilizing a highpressure H2–SF6 mixture”, Kvantovaya Elektronika, 9:3 (1982), 625–628 [Sov J Quantum Electron, 12:3 (1982), 384–387]
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