Laser-plasma synthesis of diamond films

A novel technique for plasma synthesis of diamond films (and in future of other materials) with the aid of a stationary optical discharge in flowing mixtures of reactant gases was proposed and experimentally implemented. The use of a cw CO₂ laser of 2.5 kW power acting on an Xe — H₂ — CH₄ gaseous mixture, in an atmospheric-pressure reactor developed for the purpose, made it possible to achieve diamond film deposition rates of 30 — 50 μm h^–1 on an area of 1 cm². The characteristic features and advantages of this laser-plasma deposition technique are discussed.