Contour-projection method for laser processing of materials

An analysis is made of an optical scheme used in the contour-projection laser processing method. Projecting, focusing, and telescopic variants of the illumination system are considered and their advantages and disadvantages are identified. The main types of distortion of the pattern produced in films by contour-projection processing are discussed. It is shown that, compared wth the projection processing method, the role of thermal distortions of the pattern are reduced but the influence of hydrodynamic distortions becomes greater and these are responsible for the uneven edge and structure of the boundary zone in the pattern. A brief description is given of the Kvarts-2 laser unit designed for precision processing of thin films by the contour-projection methods. Some examples of thin-film processing by this unit are cited.