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Prikladnaya Mekhanika i Tekhnicheskaya Fizika, 2018, Volume 59, Issue 5, Pages 87–92
DOI: https://doi.org/10.15372/PMTF20180510
(Mi pmtf527)
 

This article is cited in 3 scientific papers (total in 3 papers)

Effect of the flow rate of the precursor gas on the growth rate of a fluoropolymer coating during hot wire chemical vapor deposition

A. I. Safonova, V. S. Sulyaevab, A. L. Bogoslovtsevaa, N. I. Timoshenkoa

a S.S. Kutateladze Institute of Thermophysics, Siberian Division of the Russian Academy of Sciences, Novosibirsk, 630090, Russia
b Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia
Full-text PDF (283 kB) Citations (3)
Abstract: The formation of a fluoropolymer coating by chemical deposition has been studied. It has been found that increasing the flow rate of the precursor gas leads to a decrease in the growth rate of the coating. The conditions deposition was analyzed, and the gas dynamic parameters of the process were estimated. It is shown that the estimates are consistent with experimental data.
Keywords: fluoropolymer, thin films, HWCVD method, gas dynamic flow regime, catalyst.
Funding agency Grant number
Russian Science Foundation 16-19-10675
Received: 28.06.2018
English version:
Journal of Applied Mechanics and Technical Physics, 2019, Volume 59, Issue 5, Pages 842–846
DOI: https://doi.org/10.1134/S0021894418050103
Bibliographic databases:
Document Type: Article
UDC: 533.17: 541.64
Language: Russian
Citation: A. I. Safonov, V. S. Sulyaeva, A. L. Bogoslovtseva, N. I. Timoshenko, “Effect of the flow rate of the precursor gas on the growth rate of a fluoropolymer coating during hot wire chemical vapor deposition”, Prikl. Mekh. Tekh. Fiz., 59:5 (2018), 87–92; J. Appl. Mech. Tech. Phys., 59:5 (2019), 842–846
Citation in format AMSBIB
\Bibitem{SafSulBog18}
\by A.~I.~Safonov, V.~S.~Sulyaeva, A.~L.~Bogoslovtseva, N.~I.~Timoshenko
\paper Effect of the flow rate of the precursor gas on the growth rate of a fluoropolymer coating during hot wire chemical vapor deposition
\jour Prikl. Mekh. Tekh. Fiz.
\yr 2018
\vol 59
\issue 5
\pages 87--92
\mathnet{http://mi.mathnet.ru/pmtf527}
\crossref{https://doi.org/10.15372/PMTF20180510}
\elib{https://elibrary.ru/item.asp?id=35606604}
\transl
\jour J. Appl. Mech. Tech. Phys.
\yr 2019
\vol 59
\issue 5
\pages 842--846
\crossref{https://doi.org/10.1134/S0021894418050103}
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  • https://www.mathnet.ru/eng/pmtf/v59/i5/p87
  • This publication is cited in the following 3 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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    Prikladnaya Mekhanika i Tekhnicheskaya Fizika Prikladnaya Mekhanika i Tekhnicheskaya Fizika
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