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Prikladnaya Mekhanika i Tekhnicheskaya Fizika, 2018, Volume 59, Issue 5, Pages 22–30
DOI: https://doi.org/10.15372/PMTF20180503 (Mi pmtf520) 		 
This article is cited in 3 scientific papers (total in 3 papers)

Silicon film deposition using a gas-jet plasma-chemical method: experiment and gas-dynamic simulation

R. G. Sharafutdinov, P. A. Skovorodko, V. G. Shchukin, V. O. Konstantinov

S.S. Kutateladze Institute of Thermophysics, Siberian Division of the Russian Academy of Sciences, Novosibirsk, 630090, Russia
Full-text PDF (540 kB) Citations (3)
DOI: https://doi.org/10.15372/PMTF20180503
Abstract: This paper presents results of an experimental study, numerical calculation, and analysis within the framework of a gas-dynamic model of silicon film deposition by a gas-jet plasma-chemical method. A numerical model of a flow of gas mixtures, flowing out of an annular nozzle unit and flowing into a reactor, is developed, and it allows one to determine a film thickness distribution over the surface of substrates placed in the reactor and describes the experimental data obtained satisfactorily
Keywords: free jet, reactor, simulation, DSMC method, thin silicon films, electron-beam plasma, plasma-chemical deposition.
Funding agency Grant number
Russian Academy of Sciences - Federal Agency for Scientific Organizations 01201350443
Received: 04.06.2018
English version:
Journal of Applied Mechanics and Technical Physics, 2018, Volume 59, Issue 5, Pages 786–793
DOI: https://doi.org/10.1134/S0021894418050036
Bibliographic databases:
Document Type: Article
UDC: 533.17+533.9.03+539.231
Language: Russian
Citation: R. G. Sharafutdinov, P. A. Skovorodko, V. G. Shchukin, V. O. Konstantinov, “Silicon film deposition using a gas-jet plasma-chemical method: experiment and gas-dynamic simulation”, Prikl. Mekh. Tekh. Fiz., 59:5 (2018), 22–30; J. Appl. Mech. Tech. Phys., 59:5 (2018), 786–793
Citation in format AMSBIB
\Bibitem{ShaSkoShc18}
\by R.~G.~Sharafutdinov, P.~A.~Skovorodko, V.~G.~Shchukin, V.~O.~Konstantinov
\paper Silicon film deposition using a gas-jet plasma-chemical method: experiment and gas-dynamic simulation
\jour Prikl. Mekh. Tekh. Fiz.
\yr 2018
\vol 59
\issue 5
\pages 22--30
\mathnet{http://mi.mathnet.ru/pmtf520}
\crossref{https://doi.org/10.15372/PMTF20180503}
\elib{https://elibrary.ru/item.asp?id=35606597}
\transl
\jour J. Appl. Mech. Tech. Phys.
\yr 2018
\vol 59
\issue 5
\pages 786--793
\crossref{https://doi.org/10.1134/S0021894418050036}
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  • https://www.mathnet.ru/eng/pmtf/v59/i5/p22
    • This publication is cited in the following 3 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    		Prikladnaya Mekhanika i Tekhnicheskaya Fizika Prikladnaya Mekhanika i Tekhnicheskaya Fizika
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