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Prikladnaya Mekhanika i Tekhnicheskaya Fizika, 2012, Volume 53, Issue 2, Pages 61–71 (Mi pmtf1345)  

Sorption hysteresis on microrough surfaces

A. A. Bochkarev, V. I. Polyakova

Kutateladze Institute of Thermophysics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia
Abstract: Numerical experiments on the adsorption of water vapor based on vapor silver substrates with different microroughness were performed using a modified Langmuir adsorption model. The calculations revealed a number of phenomena making it possible to clarify the interpretation of many experimental data on sorption. It is established that significant initial microroughness of a silver substrate causes a sharp increase in the number of molecules of an equilibrium adsorbate and provides a stable liquid film of the adsorbate under conditions close to saturation conditions. It is shown that stability of the film state is due to the fact that its further growth or evaporation are only possible because of nucleation processes under significant supersaturation or overheating. The results obtained can be used to improve technologies based on adsorption processes.
Keywords: Langmuir adsorption model, sorption of water vapor, microroughness, multilayer adsorption, condensation.
Received: 29.03.2011
English version:
Journal of Applied Mechanics and Technical Physics, 2012, Volume 53, Issue 2, Pages 198–206
DOI: https://doi.org/10.1134/S0021894412020071
Bibliographic databases:
Document Type: Article
UDC: 699.017.23:536.423.1:621.315.592
Language: Russian
Citation: A. A. Bochkarev, V. I. Polyakova, “Sorption hysteresis on microrough surfaces”, Prikl. Mekh. Tekh. Fiz., 53:2 (2012), 61–71; J. Appl. Mech. Tech. Phys., 53:2 (2012), 198–206
Citation in format AMSBIB
\Bibitem{BocPol12}
\by A.~A.~Bochkarev, V.~I.~Polyakova
\paper Sorption hysteresis on microrough surfaces
\jour Prikl. Mekh. Tekh. Fiz.
\yr 2012
\vol 53
\issue 2
\pages 61--71
\mathnet{http://mi.mathnet.ru/pmtf1345}
\elib{https://elibrary.ru/item.asp?id=17651502}
\transl
\jour J. Appl. Mech. Tech. Phys.
\yr 2012
\vol 53
\issue 2
\pages 198--206
\crossref{https://doi.org/10.1134/S0021894412020071}
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