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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2016, Volume 42, Issue 1, Pages 42–48 (Mi pjtf6547)  
Thermal lithography of thin films of vanadium dioxide

V. N. Andreev, V. A. Klimov, M. E. Kompan

Ioffe Institute, St. Petersburg
Full-text PDF (269 kB)
Abstract: A technique is proposed for making microareas with sharply different optical and electrical properties in thin films of vanadium dioxide. The technique is based on vacuum annealing of thin films, which results in a yield of oxygen from vanadium dioxide with the formation of an oxygen vacancy in it.
Keywords: Oxygen Vacancy, Technical Physic Letter, Monoclinic Phase, Vacuum Annealing, Dielectric Phase.
Received: 11.08.2015
English version:
Technical Physics Letters, 2016, Volume 42, Issue 1, Pages 19–22
DOI: https://doi.org/10.1134/S1063785016010028
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. N. Andreev, V. A. Klimov, M. E. Kompan, “Thermal lithography of thin films of vanadium dioxide”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 42:1 (2016), 42–48; Tech. Phys. Lett., 42:1 (2016), 19–22
Citation in format AMSBIB
\Bibitem{AndKliKom16}
\by V.~N.~Andreev, V.~A.~Klimov, M.~E.~Kompan
\paper Thermal lithography of thin films of vanadium dioxide
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2016
\vol 42
\issue 1
\pages 42--48
\mathnet{http://mi.mathnet.ru/pjtf6547}
\elib{https://elibrary.ru/item.asp?id=25669654}
\transl
\jour Tech. Phys. Lett.
\yr 2016
\vol 42
\issue 1
\pages 19--22
\crossref{https://doi.org/10.1134/S1063785016010028}
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