|
Pisma v Zhurnal Tekhnicheskoi Fiziki, 2016, Volume 42, Issue 3, Pages 106–110
(Mi pjtf6525)
|
|
|
|
This article is cited in 52 scientific papers (total in 52 papers)
Microprofile formation by thermal oxidation of molybdenum films
N. L. Kazanskiiab, O. Yu. Moiseeva, S. D. Poletayevab a Image Processing Systems Institute, Russian Academy of Sciences, Samara
b Samara State Aerospace University
Abstract:
The possibility of forming a microprofile in diffractive optical elements by thermal oxidation of thin molybdenum films is analyzed. It is shown that the gain in the thickness of a starting film in the thermal oxidation process may reach a threefold value, with the optical quality of the surface preserved.
Keywords:
Technical Physic Letter, Thermal Oxidation, High Refractive Index, Molybdenum Oxide, Diffractive Optical Element.
Received: 25.09.2015
Citation:
N. L. Kazanskii, O. Yu. Moiseev, S. D. Poletayev, “Microprofile formation by thermal oxidation of molybdenum films”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 42:3 (2016), 106–110; Tech. Phys. Lett., 42:2 (2016), 164–166
Linking options:
https://www.mathnet.ru/eng/pjtf6525 https://www.mathnet.ru/eng/pjtf/v42/i3/p106
|
Statistics & downloads: |
Abstract page: | 64 | Full-text PDF : | 19 |
|