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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2016, Volume 42, Issue 15, Pages 36–42
(Mi pjtf6341)
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This article is cited in 3 scientific papers (total in 3 papers)
Crystallization of amorphous hydrogenated silicon ($a$-Si:H) films under irradiation with femtosecond laser pulses
V. P. Belika, O. S. Vasutinskiia, A. V. Kukina, M. A. Petrovab, R. S. Popovab, E. I. Terukovac a Ioffe Institute, St. Petersburg
b Peter the Great St. Petersburg Polytechnic University
c R&D Center TFTE, St.-Petersburg
Abstract:
Crystallization of thin films of amorphous hydrogenated silicon under the irradiation of femtosecond laser pulses has been studied. It was found that the crystallization has a clearly pronounced threshold nature and depends on the laser emission wavelength. As shown the best results are achieved in crystallization at the laser wavelength range of 740–760 nm.
Received: 23.03.2016
Citation:
V. P. Belik, O. S. Vasutinskii, A. V. Kukin, M. A. Petrov, R. S. Popov, E. I. Terukov, “Crystallization of amorphous hydrogenated silicon ($a$-Si:H) films under irradiation with femtosecond laser pulses”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 42:15 (2016), 36–42; Tech. Phys. Lett., 42:8 (2016), 788–791
Linking options:
https://www.mathnet.ru/eng/pjtf6341 https://www.mathnet.ru/eng/pjtf/v42/i15/p36
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Abstract page: | 38 | Full-text PDF : | 9 |
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