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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2017, Volume 43, Issue 6, Pages 15–22
DOI: https://doi.org/10.21883/PJTF.2017.06.44399.16510
(Mi pjtf5962)
 

This article is cited in 7 scientific papers (total in 7 papers)

The influence of photoelectron processes in a semiconductor substrate on the adsorption of polycationic and polyanionic molecules

S. V. Stetsyura, A. V. Kozlowski

Saratov State University
Full-text PDF (297 kB) Citations (7)
Abstract: White-light illumination during the adsorption of polyanionic molecules of glucose oxidase (GO$_x$) enzyme on the surface of $p$-Si/SiO$_{2}$/polyethylenimine structure leads to a threefold decrease in the surface concentration of GO$_x$ molecules. Same illumination during the GO$_x$ adsorption on the $n$-Si/SiO$_{2}$/PEI structure leads to a sevenfold increase in the surface concentration of enzyme molecules. Changes in the amount of adsorbed GO$_x$ molecules depending on the intensity of irradiation are explained by electron transfer processes and recharging of electronic states at the Si/SiO$_2$ interface and within SiO$_2$ layer.
Received: 29.09.2016
English version:
Technical Physics Letters, 2017, Volume 43, Issue 3, Pages 285–288
DOI: https://doi.org/10.1134/S1063785017030233
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: S. V. Stetsyura, A. V. Kozlowski, “The influence of photoelectron processes in a semiconductor substrate on the adsorption of polycationic and polyanionic molecules”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 43:6 (2017), 15–22; Tech. Phys. Lett., 43:3 (2017), 285–288
Citation in format AMSBIB
\Bibitem{SteKoz17}
\by S.~V.~Stetsyura, A.~V.~Kozlowski
\paper The influence of photoelectron processes in a semiconductor substrate on the adsorption of polycationic and polyanionic molecules
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2017
\vol 43
\issue 6
\pages 15--22
\mathnet{http://mi.mathnet.ru/pjtf5962}
\crossref{https://doi.org/10.21883/PJTF.2017.06.44399.16510}
\elib{https://elibrary.ru/item.asp?id=28997227}
\transl
\jour Tech. Phys. Lett.
\yr 2017
\vol 43
\issue 3
\pages 285--288
\crossref{https://doi.org/10.1134/S1063785017030233}
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  • This publication is cited in the following 7 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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