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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2018, Volume 44, Issue 12, Pages 52–61
DOI: https://doi.org/10.21883/PJTF.2018.12.46291.16792 (Mi pjtf5778) 		 
This article is cited in 8 scientific papers (total in 8 papers)

Synthesis of highly oriented zinc-oxide films on amorphous substrates by the method of direct-current magnetron sputtering

A. M. Ismailov, L. L. Emiraslanova, M. Kh. Rabadanov, M. R. Rabadanov, I. Sh. Aliev

Daghestan State University, Makhachkala
Full-text PDF (325 kB) Citations (8)
DOI: https://doi.org/10.21883/PJTF.2018.12.46291.16792
Abstract: We describe the technology of obtaining highly oriented zinc-oxide (ZnO) films on amorphous substrates at high growth rates (up to 7 nm/s) by means of direct-current magnetron sputtering. It is suggested to optimize the substrate position with respect to magnetron and consider the floating potential to which the substrate is charged in magnetron discharge plasma as one of the main technological parameters. Electrondiffraction study of the structural characteristics of the obtained ZnO films showed that increase in the substrate temperature was accompanied by transformation of the crystallite shape from platelike to columnar.
Funding agency Grant number
Russian Foundation for Basic Research 16-02-00227
Received: 24.03.2017
Revised: 06.02.2018
English version:
Technical Physics Letters, 2018, Volume 44, Issue 6, Pages 528–531
DOI: https://doi.org/10.1134/S1063785018060202
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: A. M. Ismailov, L. L. Emiraslanova, M. Kh. Rabadanov, M. R. Rabadanov, I. Sh. Aliev, “Synthesis of highly oriented zinc-oxide films on amorphous substrates by the method of direct-current magnetron sputtering”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:12 (2018), 52–61; Tech. Phys. Lett., 44:6 (2018), 528–531
Citation in format AMSBIB
\Bibitem{IsmEmiRab18}
\by A.~M.~Ismailov, L.~L.~Emiraslanova, M.~Kh.~Rabadanov, M.~R.~Rabadanov, I.~Sh.~Aliev
\paper Synthesis of highly oriented zinc-oxide films on amorphous substrates by the method of direct-current magnetron sputtering
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2018
\vol 44
\issue 12
\pages 52--61
\mathnet{http://mi.mathnet.ru/pjtf5778}
\crossref{https://doi.org/10.21883/PJTF.2018.12.46291.16792}
\elib{https://elibrary.ru/item.asp?id=34982922}
\transl
\jour Tech. Phys. Lett.
\yr 2018
\vol 44
\issue 6
\pages 528--531
\crossref{https://doi.org/10.1134/S1063785018060202}
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    • This publication is cited in the following 8 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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    		Pisma v Zhurnal Tekhnicheskoi Fiziki Pisma v Zhurnal Tekhnicheskoi Fiziki
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