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This article is cited in 8 scientific papers (total in 8 papers)
Synthesis of highly oriented zinc-oxide films on amorphous substrates by the method of direct-current magnetron sputtering
A. M. Ismailov, L. L. Emiraslanova, M. Kh. Rabadanov, M. R. Rabadanov, I. Sh. Aliev Daghestan State University, Makhachkala
Abstract:
We describe the technology of obtaining highly oriented zinc-oxide (ZnO) films on amorphous substrates at high growth rates (up to 7 nm/s) by means of direct-current magnetron sputtering. It is suggested to optimize the substrate position with respect to magnetron and consider the floating potential to which the substrate is charged in magnetron discharge plasma as one of the main technological parameters. Electrondiffraction study of the structural characteristics of the obtained ZnO films showed that increase in the substrate temperature was accompanied by transformation of the crystallite shape from platelike to columnar.
Received: 24.03.2017 Revised: 06.02.2018
Citation:
A. M. Ismailov, L. L. Emiraslanova, M. Kh. Rabadanov, M. R. Rabadanov, I. Sh. Aliev, “Synthesis of highly oriented zinc-oxide films on amorphous substrates by the method of direct-current magnetron sputtering”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:12 (2018), 52–61; Tech. Phys. Lett., 44:6 (2018), 528–531
Linking options:
https://www.mathnet.ru/eng/pjtf5778 https://www.mathnet.ru/eng/pjtf/v44/i12/p52
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Abstract page: | 30 | Full-text PDF : | 13 |
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