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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2018, Volume 44, Issue 15, Pages 12–19
DOI: https://doi.org/10.21883/PJTF.2018.15.46435.17145
(Mi pjtf5730)
 

This article is cited in 4 scientific papers (total in 4 papers)

Formation of a thin luminescent layer in LiF crystals under glow discharge radiation

A. A. Tyutrina, D. S. Glazunova, A. L. Rakevicha, E. F. Martynovichab

a Institute of Lazer Physics of Russian Academy of Sciences, Irkutsk Branch
b Irkutsk State University
Full-text PDF (206 kB) Citations (4)
Abstract: The formation of thin layers of luminescent defects on the faces of planar lithium fluoride crystals located in the positive column and Faraday dark space of a glow gas discharge was studied by time-resolved confocal scanning luminescent microscopy and time-correlated single photon counting. The formation of aggregated color centers in the surface layers of crystals was established using the spectral and kinetic characteristics of luminescence appearing after irradiation. The role of gas discharge electrons, ions, and photons in the defect formation mechanism was considered. The defects were shown to be formed under the influence of vacuum ultraviolet (VUV) photons. The VUV radiation intensity distribution in the discharge gap was measured by the method of thermostimulated luminescence. The main source of this radiation was the anodic and cathodic voltage drop regions in a glow discharge.
Funding agency Grant number
Program of fundamental scientific research of the State Academies of Sciences 0307-2016-0004
Ministry of Education and Science of the Russian Federation 3.8401-2017/8.9
Received: 06.12.2017
English version:
Technical Physics Letters, 2018, Volume 44, Issue 8, Pages 659–662
DOI: https://doi.org/10.1134/S1063785018080138
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: A. A. Tyutrin, D. S. Glazunov, A. L. Rakevich, E. F. Martynovich, “Formation of a thin luminescent layer in LiF crystals under glow discharge radiation”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:15 (2018), 12–19; Tech. Phys. Lett., 44:8 (2018), 659–662
Citation in format AMSBIB
\Bibitem{TyuGlaRak18}
\by A.~A.~Tyutrin, D.~S.~Glazunov, A.~L.~Rakevich, E.~F.~Martynovich
\paper Formation of a thin luminescent layer in LiF crystals under glow discharge radiation
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2018
\vol 44
\issue 15
\pages 12--19
\mathnet{http://mi.mathnet.ru/pjtf5730}
\crossref{https://doi.org/10.21883/PJTF.2018.15.46435.17145}
\elib{https://elibrary.ru/item.asp?id=35270683}
\transl
\jour Tech. Phys. Lett.
\yr 2018
\vol 44
\issue 8
\pages 659--662
\crossref{https://doi.org/10.1134/S1063785018080138}
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  • This publication is cited in the following 4 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Pisma v Zhurnal Tekhnicheskoi Fiziki Pisma v Zhurnal Tekhnicheskoi Fiziki
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