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The influence of the InAlAs layer surface morphology on the temperature dependence of parameters of Au/Ti/$n$-InAlAs (001) Schottky diodes
I. B. Chistokhina, M. S. Aksenovab, N. A. Valishevaa, D. V. Dmitrieva, I. V. Marchishina, A. I. Toropova, K. S. Zhuravlevab a Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
b Novosibirsk State University
Abstract:
Growth-related structural defects present on the surface of InAlAs layers grown by molecular beam epitaxy on InP(001) substrates influence the temperature dependences of the current–voltage characteristics of Au/Ti/InAlAs Schottky barriers. It is established that these defects in the form of pits cause the appearance of regions with reduced barrier height. At a surface density of $\ge$ 10$^7$ cm$^{-2}$, these defects significantly influence the parameters of the Schottky barriers at temperatures below 200 K.
Received: 27.11.2018 Revised: 27.11.2018 Accepted: 30.11.2018
Citation:
I. B. Chistokhin, M. S. Aksenov, N. A. Valisheva, D. V. Dmitriev, I. V. Marchishin, A. I. Toropov, K. S. Zhuravlev, “The influence of the InAlAs layer surface morphology on the temperature dependence of parameters of Au/Ti/$n$-InAlAs (001) Schottky diodes”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:4 (2019), 59–62; Tech. Phys. Lett., 45:2 (2019), 180–184
Linking options:
https://www.mathnet.ru/eng/pjtf5539 https://www.mathnet.ru/eng/pjtf/v45/i4/p59
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Abstract page: | 30 | Full-text PDF : | 10 |
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