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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2019, Volume 45, Issue 10, Pages 7–8
DOI: https://doi.org/10.21883/PJTF.2019.10.47747.17617 (Mi pjtf5429) 		 
This article is cited in 1 scientific paper (total in 1 paper)

The influence of high-frequency discharge on substrate temperature during film deposition

V. B. Shirokovab, S. P. Zinchenkoab

a Southern Research Center of the Russian Academy of Sciences, Rostov-on-Don
b Southern Federal University, Rostov-on-Don
Full-text PDF (330 kB) Citations (1)
DOI: https://doi.org/10.21883/PJTF.2019.10.47747.17617
Abstract: The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique. In a working regime of barium strontium titanate film deposition onto a magnesium oxide substrate, the substrate temperature exceeded 1000$^\circ$C.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation 01201354247
Received: 03.12.2018
Revised: 20.02.2019
Accepted: 20.02.2019
English version:
Technical Physics Letters, 2019, Volume 45, Issue 5, Pages 478–480
DOI: https://doi.org/10.1134/S1063785019050316
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: V. B. Shirokov, S. P. Zinchenko, “The influence of high-frequency discharge on substrate temperature during film deposition”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:10 (2019), 7–8; Tech. Phys. Lett., 45:5 (2019), 478–480
Citation in format AMSBIB
\Bibitem{ShiZin19}
\by V.~B.~Shirokov, S.~P.~Zinchenko
\paper The influence of high-frequency discharge on substrate temperature during film deposition
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2019
\vol 45
\issue 10
\pages 7--8
\mathnet{http://mi.mathnet.ru/pjtf5429}
\crossref{https://doi.org/10.21883/PJTF.2019.10.47747.17617}
\elib{https://elibrary.ru/item.asp?id=39133959}
\transl
\jour Tech. Phys. Lett.
\yr 2019
\vol 45
\issue 5
\pages 478--480
\crossref{https://doi.org/10.1134/S1063785019050316}
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    • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    		Pisma v Zhurnal Tekhnicheskoi Fiziki Pisma v Zhurnal Tekhnicheskoi Fiziki
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