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This article is cited in 1 scientific paper (total in 1 paper)
Adhesion at Ta(Mo)/NiTi interface
A. V. Bakulinab, S. E. Kul'kovaab a Institute of Strength Physics and Materials Science, Siberian Branch of the Russian Academy of Sciences, Tomsk, Russia
b Tomsk State University
Abstract:
The atomic and electronic structure of the $Ме$(110)/NiTi(110) and TiO$_2$(100)/$Me$(110) interfaces, where $Me$ = Ta, Mo was investigated by the projected augmented-waves method within the density functional theory. It has been shown that the formation of intermediate oxide layers at the metal–alloy interface leads to adhesion decrease.
Keywords:
NiTi, interface, adhesion.
Received: 28.02.2019 Revised: 27.03.2019 Accepted: 27.03.2019
Citation:
A. V. Bakulin, S. E. Kul'kova, “Adhesion at Ta(Mo)/NiTi interface”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:12 (2019), 37–41; Tech. Phys. Lett., 45:6 (2019), 620–624
Linking options:
https://www.mathnet.ru/eng/pjtf5408 https://www.mathnet.ru/eng/pjtf/v45/i12/p37
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Abstract page: | 59 | Full-text PDF : | 12 |
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