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This article is cited in 2 scientific papers (total in 2 papers)
Assessing the thickness of thin films based on elemental data composition of film structures
Yu. M. Nikolaenko, A. S. Korneevets, N. B. Efros, V. V. Burkhovetskiy, I. Yu. Reshidova O O Galkin Donetsk Institute for Physics and Engineering, National Academy of Sciences of Ukraine
Abstract:
We demonstrate the possibility of a quantitative assessment of the thickness of thin films using to measurements of the cationic composition of film structures using the INCA Energy-350 energy dispersion spectrometer that is part of the JSM-6490 LV electron microscope (Japan). The use of this method is especially useful if it is impossible to provide sufficient contrast between the images of the film and substrate sections obtained with a scanning electron microscope on a transverse cleavage of the film structure.
Keywords:
scanning electron microscope, energy dispersive X-ray spectrometer, nanosized films, magnetron sputtering method of targets.
Received: 21.02.2019 Revised: 08.04.2019 Accepted: 11.04.2019
Citation:
Yu. M. Nikolaenko, A. S. Korneevets, N. B. Efros, V. V. Burkhovetskiy, I. Yu. Reshidova, “Assessing the thickness of thin films based on elemental data composition of film structures”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:13 (2019), 44–47; Tech. Phys. Lett., 45:7 (2019), 679–682
Linking options:
https://www.mathnet.ru/eng/pjtf5395 https://www.mathnet.ru/eng/pjtf/v45/i13/p44
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