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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2019, Volume 45, Issue 19, Pages 17–20
DOI: https://doi.org/10.21883/PJTF.2019.19.48311.17906
(Mi pjtf5303)
 

This article is cited in 1 scientific paper (total in 1 paper)

Structural changes in Si–CuSi films upon intercalation of lithium ions

È. Yu. Buchina, A. A. Mironenkoa, V. V. Naumova, A. S. Rudyia, I. S. Fedorovb

a Valiev Institute of Physics and Technology, Yaroslavl Branch, Russian Academy of Sciences, Yaroslavl, Russia
b P.G. Demidov Yaroslavl State University
Full-text PDF (485 kB) Citations (1)
Abstract: We studied the possibility of using composite films representing amorphous silicon reinforced with crystalline inclusions of copper silicide as an anode material for lithium-ion batteries with liquid electrolyte. The films were made by layer-by-layer magnetron sputtering of amorphous silicon and copper, followed by low-temperature (100–200$^\circ$C) annealing of the structure. The tests of the anodes revealed the effect of prolonged intense growth of their reversible capacity. To describe the effect, a phenomenological model based on the multidirectional migration of silicon and copper atoms in an inhomogeneous field of elastic mechanical stresses arising during electrode cycling is proposed.
Keywords: nanocomposite film, capacitive profile, vacancy voids, gradient of elastic stresses, atomic migration.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation 0066-2019-0002
This work was carried out as part of a state order of the Ministry of Education and Science of the Russian Federation to the Valiev Physical and Technological Institute, Russian Academy of Sciences, project no. 0066-2019-0002.
Received: 05.06.2019
Revised: 18.06.2019
Accepted: 18.06.2019
English version:
Technical Physics Letters, 2019, Volume 45, Issue 10, Pages 973–976
DOI: https://doi.org/10.1134/S1063785019100043
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: È. Yu. Buchin, A. A. Mironenko, V. V. Naumov, A. S. Rudyi, I. S. Fedorov, “Structural changes in Si–CuSi films upon intercalation of lithium ions”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:19 (2019), 17–20; Tech. Phys. Lett., 45:10 (2019), 973–976
Citation in format AMSBIB
\Bibitem{BucMirNau19}
\by \`E.~Yu.~Buchin, A.~A.~Mironenko, V.~V.~Naumov, A.~S.~Rudyi, I.~S.~Fedorov
\paper Structural changes in Si--CuSi films upon intercalation of lithium ions
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2019
\vol 45
\issue 19
\pages 17--20
\mathnet{http://mi.mathnet.ru/pjtf5303}
\crossref{https://doi.org/10.21883/PJTF.2019.19.48311.17906}
\elib{https://elibrary.ru/item.asp?id=41300887}
\transl
\jour Tech. Phys. Lett.
\yr 2019
\vol 45
\issue 10
\pages 973--976
\crossref{https://doi.org/10.1134/S1063785019100043}
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  • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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    Pisma v Zhurnal Tekhnicheskoi Fiziki Pisma v Zhurnal Tekhnicheskoi Fiziki
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