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This article is cited in 9 scientific papers (total in 9 papers)
Studying the effect of doping with nickel on silicon-based solar cells with a deep $p$–$n$-junction
M. K. Bakhadyrkhanova, S. B. Isamova, Z. T. Kenzhaevb, S. V. Koveshnikova a Tashkent State Technical University, Tashkent, Uzbekistan
b Karakalpak State University named after Berdakh, Nukus, Uzbekistan
Abstract:
It is shown that doping front side of solar cell with deep-lying $p$–$n$ junction with nickel atoms leads to significant increase in $J_{sc}$ – 89% and $V_{oc}$ – 19.7%. Additional heat treatment at 700$^{\circ}$C for one hour leads to an increase in $J_{sc}$ – 98,4% and $V_{oc}$ – 13,18%. Growth in efficiency of conversion of infrared radiation is occurs due to formation of clusters of nickel atoms, which are getter centers for uncontrolled recombination impurities.
Keywords:
silicon, nickel, doping, thermo-annealing, clusters, collection coefficient, lifetime.
Received: 03.06.2019 Revised: 11.06.2019 Accepted: 13.06.2019
Citation:
M. K. Bakhadyrkhanov, S. B. Isamov, Z. T. Kenzhaev, S. V. Koveshnikov, “Studying the effect of doping with nickel on silicon-based solar cells with a deep $p$–$n$-junction”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:19 (2019), 3–6; Tech. Phys. Lett., 45:10 (2019), 959–962
Linking options:
https://www.mathnet.ru/eng/pjtf5299 https://www.mathnet.ru/eng/pjtf/v45/i19/p3
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