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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2019, Volume 45, Issue 23, Pages 19–22
DOI: https://doi.org/10.21883/PJTF.2019.23.48713.17955 (Mi pjtf5249) 		 
Elastic scattering of neutral fluorine on Si, O, C, and H atoms in the range of the relative kinetic energies of 2–200 eV

A. P. Palova, J. Zhangb, M. Baklanovb, Sh. Weib

a Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics
b Institute of Electronic Information Engineering, North China University of Technology, Beijing, China
Full-text PDF (367 kB)
DOI: https://doi.org/10.21883/PJTF.2019.23.48713.17955
Abstract: Binary interatomic potentials F–F, F–Si, F–O, F–C and F–H are calculated from the first principles (ab initio) on the basis of the multi-configuration method of self-consistent field (CAS-SCF) with a basic set of atomic wave functions aug-pp-AV6Z and are used to calculate phase shifts and cross sections of elastic scattering of atoms in the range of relative kinetic energies 2–200 eV. It is expected that the obtained elastic scattering cross sections will be useful for describing sputtering and etching of porous organosilicate films with ethylene bridges used in modern nanoelectronics.
Keywords: sputtering, etching, fluorine, organosilicate glasses.
Funding agency Grant number
Russian Foundation for Basic Research 18-52-53017
National Natural Science Foundation of China 81811530114
The research was supported by Russian Foundation of the Basic Research (grant no. 18-52-53017) and National Natural Science Foundation of China (grant no. 81811530114).
Received: 28.06.2019
Revised: 28.06.2019
Accepted: 26.08.2019
English version:
Technical Physics Letters, 2019, Volume 45, Issue 12, Pages 1187–1190
DOI: https://doi.org/10.1134/S1063785019120113
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: A. P. Palov, J. Zhang, M. Baklanov, Sh. Wei, “Elastic scattering of neutral fluorine on Si, O, C, and H atoms in the range of the relative kinetic energies of 2–200 eV”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:23 (2019), 19–22; Tech. Phys. Lett., 45:12 (2019), 1187–1190
Citation in format AMSBIB
\Bibitem{PalZhaBak19}
\by A.~P.~Palov, J.~Zhang, M.~Baklanov, Sh.~Wei
\paper Elastic scattering of neutral fluorine on Si, O, C, and H atoms in the range of the relative kinetic energies of 2--200 eV
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2019
\vol 45
\issue 23
\pages 19--22
\mathnet{http://mi.mathnet.ru/pjtf5249}
\crossref{https://doi.org/10.21883/PJTF.2019.23.48713.17955}
\elib{https://elibrary.ru/item.asp?id=41848495}
\transl
\jour Tech. Phys. Lett.
\yr 2019
\vol 45
\issue 12
\pages 1187--1190
\crossref{https://doi.org/10.1134/S1063785019120113}
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