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This article is cited in 2 scientific papers (total in 2 papers)
Structure and ferroelectric properties of thin heteroepitaxial NaNbO$_{3}$ films obtained by RF cathode sputtering
A. V. Pavlenkoab, D. V. Stryukova, N. V. Ter-Oganessianb a Southern Research Center of the Russian Academy of Sciences, Rostov-on-Don
b Research Institute of Physics, Southern Federal University
Abstract:
Thin films of sodium niobate (NaNbO3) on a MgO(001) substrate with a predeposited SrRuO$_3$ layer were obtained for the first time by the method of RF cathode sputtering in an oxygen atmosphere. X-ray diffraction data showed the obtained films to be single-phase and single-crystalline. The parameters of the unit cells of NaNbO$_3$ and SrRuO$_3$ layers in the tetragonal approximation were found to be $c_{\mathrm{NaNbO}_3}$ = 0.3940 (1) nm, $a_{\mathrm{NaNbO}_3}$ = 0.389 (1) nm; $c_{\mathrm{SrRuO_3}}$ = 0.4004 (1) nm, and $a_{\mathrm{SrRuO}_3}$ = 0.392 (3) nm. Misfit strain of the unit cell of NaNbO$_3$ amounted to $\varepsilon_{33}$ = 0.007 and $\varepsilon_{11}$ = 0.002. The results of dielectric and piezoelectric measurements showed that the films occurred in a ferroelectric state.
Keywords:
thin films, sodium niobate, dielectric characteristics, unit cell deformation.
Received: 23.09.2019 Revised: 09.10.2019 Accepted: 14.10.2019
Citation:
A. V. Pavlenko, D. V. Stryukov, N. V. Ter-Oganessian, “Structure and ferroelectric properties of thin heteroepitaxial NaNbO$_{3}$ films obtained by RF cathode sputtering”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:2 (2020), 15–18; Tech. Phys. Lett., 46:1 (2020), 62–65
Linking options:
https://www.mathnet.ru/eng/pjtf5207 https://www.mathnet.ru/eng/pjtf/v46/i2/p15
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