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High-rate growth of bicrystal ZnO films on a rhombohedral sapphire plane
A. È. Muslimova, A. M. Ismailovb, A. Sh. Asvarovac, V. A. Babaevb, V. M. Kanevskiia a Institute of Cristallography Russian Academy of Sciences, Moscow
b Daghestan State University, Makhachkala
c Daghestan Institute of Physics after Amirkhanov
Abstract:
A method for growing bicrystal ZnO films using the specific features of magnetron sputtering and the orienting effect of a rhombohedral sapphire plane is proposed. It is shown that the successive application of two deposition regimes ($\sim$2 and $\sim$16 nm/s) leads to the formation of a bicrystal film with the (110)-oriented lower sublayer and the (002)-oriented upper sublayer. Recrystallization annealing at 1000$^\circ$C for 10 h does not affect the upper (002)-oriented layer and induces stress relaxation in the lower (110)-oriented layer.
Keywords:
zinc oxide, diffraction, bicrystal films.
Received: 05.07.2019 Revised: 17.03.2020 Accepted: 17.03.2020
Citation:
A. È. Muslimov, A. M. Ismailov, A. Sh. Asvarov, V. A. Babaev, V. M. Kanevskii, “High-rate growth of bicrystal ZnO films on a rhombohedral sapphire plane”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:11 (2020), 51–54; Tech. Phys. Lett., 46:6 (2020), 568–571
Linking options:
https://www.mathnet.ru/eng/pjtf5094 https://www.mathnet.ru/eng/pjtf/v46/i11/p51
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Abstract page: | 40 | Full-text PDF : | 18 |
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