Low-pressure inductively coupled CF$_{3}$Br plasma studied by the Langmuir probe and optical emission spectroscopy techniques

The parameters of the inductively coupled low pressure CF$_{3}$Br plasma were measured by the Langmuir probe and actinometry. The electron temperature and concentrations of electrons and positive ions, as well as fluorine and bromine radicals, have been determined. An explanation is proposed for the previously observed significant degradation of low-k dielectrics during etching in the studied plasma.