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AlSb/InAs heterostructures for microwave transistors
M. A. Sukhanova, A. K. Bakarovab, K. S. Zhuravlevab a Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
b Novosibirsk State University
Abstract:
Features of the molecular beam epitaxy growth of the AlSb/InAs heterostructures with a high-mobility two-dimensional electron gas for microwave transistors with ultralow power consumption are described. The main stages of fabrication of the transistors based on the AlSb/InAs heterostructures are outlined. The drain and drain–gate characteristics of the transistors are reported and discussed.
Keywords:
AlSb/InAs heterostructures, molecular beam epitaxy, high electron mobility transistor.
Received: 16.10.2020 Revised: 25.10.2020 Accepted: 25.10.2020
Citation:
M. A. Sukhanov, A. K. Bakarov, K. S. Zhuravlev, “AlSb/InAs heterostructures for microwave transistors”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:3 (2021), 37–39; Tech. Phys. Lett., 47:2 (2021), 139–142
Linking options:
https://www.mathnet.ru/eng/pjtf4872 https://www.mathnet.ru/eng/pjtf/v47/i3/p37
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Abstract page: | 55 | Full-text PDF : | 37 |
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