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This article is cited in 1 scientific paper (total in 1 paper)
Obtaining TiN coatings by reactive anodic evaporation of titanium in a gas discharge with a self-heated hollow cathode
A. I. Men'shakovab, D. R. Emlina a Institute of Electrophysics, Ural Branch, Russian Academy of Sciences, Ekaterinburg
b Ural Federal University named after the First President of Russia B. N. Yeltsin, Ekaterinburg
Abstract:
A method for TiN-coatings deposition by anodic evaporation of titanium in a high-current gas discharge (30 A) with a self–heated hollow cathode in an Ar+N$_2$ medium is proposed. Optical spectral analysis shows that a large amount of activated titanium is present in the gas-discharge plasma, and the proportion of metal ions coming from the plasma to the substrate, taking into account the single-charge ions, reaches 70%. At a nitrogen flow of 5 sccm, TiN-coatings with a thickness of 2 $\mu$m and a hardness of up to 24 GPa were obtained. The deposition rate at a distance of 7 cm from the vapor source was $\sim$4 $\mu$m/h.
Keywords:
titanium nitride, anodic evaporation, self-heated hollow cathode, PVD.
Received: 07.12.2020 Revised: 07.12.2020 Accepted: 22.02.2021
Citation:
A. I. Men'shakov, D. R. Emlin, “Obtaining TiN coatings by reactive anodic evaporation of titanium in a gas discharge with a self-heated hollow cathode”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:10 (2021), 35–37; Tech. Phys. Lett., 47:7 (2021), 511–514
Linking options:
https://www.mathnet.ru/eng/pjtf4788 https://www.mathnet.ru/eng/pjtf/v47/i10/p35
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