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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2021, Volume 47, Issue 11, Pages 44–47
DOI: https://doi.org/10.21883/PJTF.2021.11.51008.18717 (Mi pjtf4777) 		 
The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at reactive ion etching of large substrates

S. D. Poletayevab, A. I. Lyubimovc

a Image Processing Systems Institute of the RAS - Branch of the FSRC "Crystallography and Photonics" RAS, Samara, Russia, Samara
b Samara National Research University
c State Institute of Applied Optics Federal Research and Production Centre, Kazan
Full-text PDF (96 kB)
DOI: https://doi.org/10.21883/PJTF.2021.11.51008.18717
Abstract: The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at selective reactive ion mask etching of large substrates in Freon-14 has been investigated both theoretically and experimentally. It is shown for masks with a coating of substrates of more than 30% that the reactive power component increases at distances from the center that are close to the substrate radius. It is established that the specific reactive power is independent of the thickness and type of metal masks. It is shown experimentally that masks with any substrate-coating coefficient of practical importance connected to the lower electrode via a substrate holder improve matching by decreasing the power reflectance.
Keywords: diffractive microrelief, reactive ion etching, impedance, substrate holder, lower electrode.
Funding agency Grant number
Ministry of Education and Science of the Russian Federation 007-ÃÇ/43363/26
08/2017
This study was performed within the framework of a state assignment for the Federal Scientific Research Center “Crystallography and Photonics” of the Russian Academy of Sciences (agreement no. 007-GZ/43363/26) and agreement on research no. 08/2017 (the ordering customer being the State Institute of Applied Optics).
Received: 25.01.2021
Revised: 12.03.2021
Accepted: 12.03.2021
English version:
Technical Physics Letters, 2021, Volume 47, Issue 8, Pages 569–572
DOI: https://doi.org/10.1134/S1063785021060122
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: S. D. Poletayev, A. I. Lyubimov, “The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at reactive ion etching of large substrates”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:11 (2021), 44–47; Tech. Phys. Lett., 47:8 (2021), 569–572
Citation in format AMSBIB
\Bibitem{PolLyu21}
\by S.~D.~Poletayev, A.~I.~Lyubimov
\paper The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at reactive ion etching of large substrates
\jour Pisma v Zhurnal Tekhnicheskoi Fiziki
\yr 2021
\vol 47
\issue 11
\pages 44--47
\mathnet{http://mi.mathnet.ru/pjtf4777}
\crossref{https://doi.org/10.21883/PJTF.2021.11.51008.18717}
\elib{https://elibrary.ru/item.asp?id=46321612}
\transl
\jour Tech. Phys. Lett.
\yr 2021
\vol 47
\issue 8
\pages 569--572
\crossref{https://doi.org/10.1134/S1063785021060122}
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