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Gan-on-silicon growth features: controlled plastic deformation
I. S. Ezubchenko, M. Y. Chernykh, P. A. Perminov, Yu. V. Grishchenko, I. N. Trunkin, I. A. Chernykh, M. L. Zanaveskin National Research Centre "Kurchatov Institute", Moscow
Abstract:
Gallium nitride heterostructures were grown on silicon substrates by metalorganic chemical vapor deposition. Plastic deformations of the substrate are observed that occurred during growth at temperatures of 930 – 975$^\circ$C due to effective accumulation of compressive stress in the film. A method is proposed for controlled plastic deformation of silicon by high-temperature annealing with simultaneous in situ growth of a SiN$_x$ layer after the heterostructure is grown. This approach makes it possible to simplify the optimization of architecture of gallium nitride heterostructures for various technological task.
Keywords:
nitride heterostructure, metalorganic chemical vapour deposition, gallium nitride, silicon, plastic deformation.
Received: 12.03.2021 Revised: 06.04.2021 Accepted: 20.04.2021
Citation:
I. S. Ezubchenko, M. Y. Chernykh, P. A. Perminov, Yu. V. Grishchenko, I. N. Trunkin, I. A. Chernykh, M. L. Zanaveskin, “Gan-on-silicon growth features: controlled plastic deformation”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:14 (2021), 26–29; Tech. Phys. Lett., 47:10 (2021), 705–708
Linking options:
https://www.mathnet.ru/eng/pjtf4733 https://www.mathnet.ru/eng/pjtf/v47/i14/p26
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Abstract page: | 57 | Full-text PDF : | 50 |
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