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This article is cited in 2 scientific papers (total in 2 papers)
MBE growth of InGaN nanowires on SiC/Si(111) and Si(111) substrates
V. O. Gridchinab, R. R. Reznikb, K. P. Kotlyarab, A. S. Dragunovaac, N. V. Kryzhanovskayaac, A. Yu. Serovb, S. A. Kukushkind, G. E. Cirlinabe a Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
b Saint Petersburg State University
c National Research University "Higher School of Economics", St. Petersburg Branch
d Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, St. Petersburg
e Institute for Analytical Instrumentation, Russian Academy of Sciences, St. Petersburg
Abstract:
In this work, InGaN nanowires with a high In content were grown, for the first time, on hybrid SiC/Si substrates and compared with InGaN nanowires grown on Si. It was shown that InGaN nanowires on SiC/Si have lower indium content (by about 10%) compared to the nanowires on Si. The results can be beneficial for studying the growth mechanisms of InGaN nanowires and creating optoelectronic devices in the visible spectral range.
Keywords:
InGaN, nanowires, molecular beam epitaxy, SiC/Si, morphological properties, optical properties, miscibility gap, silicon carbide on silicon.
Received: 01.06.2021 Revised: 12.07.2021 Accepted: 19.07.2021
Citation:
V. O. Gridchin, R. R. Reznik, K. P. Kotlyar, A. S. Dragunova, N. V. Kryzhanovskaya, A. Yu. Serov, S. A. Kukushkin, G. E. Cirlin, “MBE growth of InGaN nanowires on SiC/Si(111) and Si(111) substrates”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:21 (2021), 32–35
Linking options:
https://www.mathnet.ru/eng/pjtf4639 https://www.mathnet.ru/eng/pjtf/v47/i21/p32
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