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Pisma v Zhurnal Tekhnicheskoi Fiziki, 1985, Volume 11, Issue 24, Pages 1512–1515
(Mi pjtf1091)
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Element component rupture in $Si\,O_2$ during ion-activated chemical etching
L. J. Ðãànyavichyus, S. I. Tamulevichus, A. P. Matukas Kaunas University of Technology
Received: 24.07.1985
Citation:
L. J. Ðãànyavichyus, S. I. Tamulevichus, A. P. Matukas, “Element component rupture in $Si\,O_2$ during ion-activated chemical etching”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 11:24 (1985), 1512–1515
Linking options:
https://www.mathnet.ru/eng/pjtf1091 https://www.mathnet.ru/eng/pjtf/v11/i24/p1512
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Statistics & downloads: |
Abstract page: | 42 | Full-text PDF : | 13 |
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