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Fizika i Tekhnika Poluprovodnikov, 2020, Volume 54, Issue 8, Page 778
(Mi phts6656)
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This article is cited in 8 scientific papers (total in 8 papers)
Manufacturing, processing, testing of materials and structures
Micro-structural and thermoelectric characterization of zinc-doped In$_{0.6}$Se$_{0.4}$ crystal grown by direct vapour transport method
P. B. Patelab, H. N. Desaiab, J. M. Dhimmarc, B. P. Modic a C.B. Patel Computer College, Surat, 395017 India
b J.N.M. Patel Science College, Surat, 395017 India
c Department of Physics, Veer Narmad South Gujarat University,
Surat, 395017 India
Abstract:
Crystal of zinc-doped In$_{0.6}$Se$_{0.4}$ was successfully grown by direct vapour transport (DVT) method. Grown In$_{0.6}$Se$_{0.4}$ : Zn crystal has been characterized by energy dispersive $X$-ray (EDAX) and powder $X$-ray diffractometer (XRD) techniques for compositional and micro-structural analysis, respectively. The EDAX spectra represent the grown In$_{0.6}$Se$_{0.4}$ : Zn crystal enriched with excess indium doped with Zn, which consecutively shows enhanced $n$-type conductivity. The powder XRD spectrum signified that the grown sample was crystalline and had hexagonal structure. The micro-structural parameters: average crystallite size, average lattice strain, dislocation density, and domain population were determined from powder XRD spectra. The thermoelectric properties such as Seebeck coefficient $(S)$, electrical resistivity ($\sigma^-$), and thermal conductivity $(\kappa)$ were measured in the temperature range of 313 to 368 K. Grown In$_{0.6}$Se$_{0.4}$ : Zn crystal reported Seebeck coefficient $(S)$ as high as -548 $\mu$VK$^{-1}$ and figure of merit of 1.14 at 368 K
Keywords:
DVT method, $X$-ray diffraction, micro-structural parameters, Seebeck coefficient, figure of merit.
Received: 10.08.2019 Revised: 08.04.2020 Accepted: 10.04.2020
Citation:
P. B. Patel, H. N. Desai, J. M. Dhimmar, B. P. Modi, “Micro-structural and thermoelectric characterization of zinc-doped In$_{0.6}$Se$_{0.4}$ crystal grown by direct vapour transport method”, Fizika i Tekhnika Poluprovodnikov, 54:8 (2020), 778; Semiconductors, 54:8 (2020), 923–928
Linking options:
https://www.mathnet.ru/eng/phts6656 https://www.mathnet.ru/eng/phts/v54/i8/p778
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