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Fizika i Tekhnika Poluprovodnikov, 2021, Volume 55, Issue 8, Page 680 (Mi phts6621)  

Surface, interfaces, thin films

Effect of complexing agents on structural, morphological, and optical properties of chemically deposited ZnO thin films

A. Raidou

Materials and Subatomic Physics Laboratory, Department of Physics, Faculty of Sciences, Ibn Tofail University, B.P 133, 14000 Kénitra, Morocco
Abstract: Two ZnO thin films have been chemically elaborated on glass substrates by successive ionic layer adsorption and reaction method using two different complexing agents, ammonia and ammonium hydroxide. X-ray diffraction study confirmed the hexagonal wurtzite structure for both films that are polycrystalline with preferential direction (002). Scanning electron microscopy showed an agglomeration of small grains throughout the substrate surfaces, with morphological changes and the existence of an uncovered part of substrates. The film prepared using NH$_4$OH showed a higher transmittance. The optical band gap values for the films are close to 3.36 and 3.33 eV, respectively.
Keywords: thin films, ZnO, complexing agents, SILAR method, semiconductors.
Received: 22.08.2020
Revised: 22.08.2020
Accepted: 09.02.2021
English version:
Semiconductors, 2021, Volume 55, Issue 8, Pages 691–695
DOI: https://doi.org/10.1134/S1063782621080157
Document Type: Article
Language: English
Citation: A. Raidou, “Effect of complexing agents on structural, morphological, and optical properties of chemically deposited ZnO thin films”, Fizika i Tekhnika Poluprovodnikov, 55:8 (2021), 680; Semiconductors, 55:8 (2021), 691–695
Citation in format AMSBIB
\Bibitem{Rai21}
\by A.~Raidou
\paper Effect of complexing agents on structural, morphological, and optical properties of chemically deposited ZnO thin films
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2021
\vol 55
\issue 8
\pages 680
\mathnet{http://mi.mathnet.ru/phts6621}
\transl
\jour Semiconductors
\yr 2021
\vol 55
\issue 8
\pages 691--695
\crossref{https://doi.org/10.1134/S1063782621080157}
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