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Fizika i Tekhnika Poluprovodnikov, 2016, Volume 50, Issue 3, Pages 377–381 (Mi phts6519)  
This article is cited in 12 scientific papers (total in 12 papers)

Micro- and nanocrystalline, porous, composite semiconductors

Influence of the surface layer on the electrochemical deposition of metals and semiconductors into mesoporous silicon

E. B. Chubenko, S. V. Red'ko, A. I. Sherstnyov, В. А. Петрович, D. A. Kotov, V. P. Bondarenko

Belarussian State University of Computer Science and Radioelectronic Engineering
Full-text PDF (1885 kB) Citations (12)
Abstract: The influence of the surface layer on the process of the electrochemical deposition of metals and semiconductors into porous silicon is studied. It is shown that the surface layer differs in structure and electrical characteristics from the host porous silicon bulk. It is established that a decrease in the conductivity of silicon crystallites that form the surface layer of porous silicon has a positive effect on the process of the filling of porous silicon with metals and semiconductors. This is demonstrated by the example of nickel and zinc oxide. The effect can be used for the formation of nanocomposite materials on the basis of porous silicon and nanostructures with a high aspect ratio.
Keywords: Zinc Oxide, Scanning Electron Microscopy Micrographs, Porous Silicon, Porous Layer, Electrochemical Deposition.
Received: 28.05.2015
Accepted: 14.07.2015
English version:
Semiconductors, 2016, Volume 50, Issue 3, Pages 372–376
DOI: https://doi.org/10.1134/S1063782616030040
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: E. B. Chubenko, S. V. Red'ko, A. I. Sherstnyov, В. А. Петрович, D. A. Kotov, V. P. Bondarenko, “Influence of the surface layer on the electrochemical deposition of metals and semiconductors into mesoporous silicon”, Fizika i Tekhnika Poluprovodnikov, 50:3 (2016), 377–381; Semiconductors, 50:3 (2016), 372–376
Citation in format AMSBIB
\Bibitem{ChuRedShe16}
\by E.~B.~Chubenko, S.~V.~Red'ko, A.~I.~Sherstnyov, В.~А.~Петрович, D.~A.~Kotov, V.~P.~Bondarenko
\paper Influence of the surface layer on the electrochemical deposition of metals and semiconductors into mesoporous silicon
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2016
\vol 50
\issue 3
\pages 377--381
\mathnet{http://mi.mathnet.ru/phts6519}
\elib{https://elibrary.ru/item.asp?id=25668190}
\transl
\jour Semiconductors
\yr 2016
\vol 50
\issue 3
\pages 372--376
\crossref{https://doi.org/10.1134/S1063782616030040}
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  • https://www.mathnet.ru/eng/phts6519
  • https://www.mathnet.ru/eng/phts/v50/i3/p377
    • This publication is cited in the following 12 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    		Fizika i Tekhnika Poluprovodnikov Fizika i Tekhnika Poluprovodnikov
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