|
Fizika i Tekhnika Poluprovodnikov, 2016, Volume 50, Issue 3, Pages 354–356
(Mi phts6516)
|
|
|
|
This article is cited in 4 scientific papers (total in 4 papers)
Semiconductor structures, low-dimensional systems, quantum phenomena
Two stages of surface-defect formation in a MOS structure under low-dose rate $\gamma$ irradiation
V. D. Popov National Engineering Physics Institute "MEPhI", Moscow
Abstract:
The results of an experimental study of how surface defects are formed at the Si–SiO$_2$ interface at $\gamma$-radiation dose rates of $P$ = 0.1 and 1.0 rad/s are reported. It is found that the surface defects are formed in two stages. The defect-formation mechanisms are analyzed.
Keywords:
Dose Rate, Surface Defect, Exponential Dependence, Gate Oxide, Threshold Time.
Received: 11.06.2015 Accepted: 17.06.2015
Citation:
V. D. Popov, “Two stages of surface-defect formation in a MOS structure under low-dose rate $\gamma$ irradiation”, Fizika i Tekhnika Poluprovodnikov, 50:3 (2016), 354–356; Semiconductors, 50:3 (2016), 349–351
Linking options:
https://www.mathnet.ru/eng/phts6516 https://www.mathnet.ru/eng/phts/v50/i3/p354
|
Statistics & downloads: |
Abstract page: | 42 | Full-text PDF : | 15 |
|