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Fizika i Tekhnika Poluprovodnikov, 2016, Volume 50, Issue 8, Pages 1030–1035 (Mi phts6381)  

This article is cited in 15 scientific papers (total in 15 papers)

Surface, interfaces, thin films

Electrical, optical, and photoluminescence properties of ZnO films subjected to thermal annealing and treatment in hydrogen plasma

Kh. A. Abdullina, M. T. Gabdullina, L. V. Gritsenkob, D. V. Ismailova, Zh. K. Kalkozovaa, S. E. Kumekovb, Zh. O. Mukashb, A. Yu. Sazonovc, E. I. Terukovd

a National Nanotechnology Laboratory of open type, al-Farabi KazNU, Almaty, Kazakhstan
b Kazakh National Technical University after K. I. Satpaev, Almaty, Kazakhstan
c University of Waterloo, Waterloo, Canada
d Ioffe Institute, St. Petersburg
Abstract: The photoluminescence and optical absorption spectra and electrical properties of ZnO films grown by the metal–organic chemical vapor deposition and hydrothermal techniques, subjected to heat treatments and plasma treatment in a hydrogen atmosphere, are studied. It is shown that the adsorption of oxygen at grain boundaries upon annealing in an oxidizing atmosphere determines the electrical properties of the films. Vacuum annealing improves the electrical properties of the samples after degradation induced by annealing in air. Treatment in hydrogen plasma passivates surface states at the grain boundaries. The intrinsic photoluminescence intensity after plasma treatment is higher in the case of increased amounts of oxygen adsorbed at grain surfaces upon annealing in air. Surface states involving oxygen and hydrogen atoms are responsible for the high-intensity intrinsic photoluminescence band.
Received: 18.01.2016
Accepted: 25.01.2016
English version:
Semiconductors, 2016, Volume 50, Issue 8, Pages 1010–1014
DOI: https://doi.org/10.1134/S1063782616080029
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: Kh. A. Abdullin, M. T. Gabdullin, L. V. Gritsenko, D. V. Ismailov, Zh. K. Kalkozova, S. E. Kumekov, Zh. O. Mukash, A. Yu. Sazonov, E. I. Terukov, “Electrical, optical, and photoluminescence properties of ZnO films subjected to thermal annealing and treatment in hydrogen plasma”, Fizika i Tekhnika Poluprovodnikov, 50:8 (2016), 1030–1035; Semiconductors, 50:8 (2016), 1010–1014
Citation in format AMSBIB
\Bibitem{AbdGabGri16}
\by Kh.~A.~Abdullin, M.~T.~Gabdullin, L.~V.~Gritsenko, D.~V.~Ismailov, Zh.~K.~Kalkozova, S.~E.~Kumekov, Zh.~O.~Mukash, A.~Yu.~Sazonov, E.~I.~Terukov
\paper Electrical, optical, and photoluminescence properties of ZnO films subjected to thermal annealing and treatment in hydrogen plasma
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2016
\vol 50
\issue 8
\pages 1030--1035
\mathnet{http://mi.mathnet.ru/phts6381}
\elib{https://elibrary.ru/item.asp?id=27368956}
\transl
\jour Semiconductors
\yr 2016
\vol 50
\issue 8
\pages 1010--1014
\crossref{https://doi.org/10.1134/S1063782616080029}
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  • https://www.mathnet.ru/eng/phts/v50/i8/p1030
  • This publication is cited in the following 15 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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    Fizika i Tekhnika Poluprovodnikov Fizika i Tekhnika Poluprovodnikov
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