Optimization of structural and growth parameters of metamorphic InGaAs photovoltaic converters grown by MOCVD

Metamorphic Ga$_{0.76}$In$_{0.24}$As heterostructures for photovoltaic converters are grown by the MOCVD (metal–organic chemical vapor deposition) technique. It is found that, due to the valence-band offset at the $p$-In$_{0.24}$Al$_{0.76}$As /$p$-In$_{0.24}$Ga$_{0.76}$As (wide-gap window/emitter) heterointerface, a potential barrier for holes arises as a result of a low carrier concentration in the wide-gap material. The use of an InAlGaAs solid solution with an Al content lower than 40% makes it possible to raise the hole concentration in the widegap window up $\sim$9 $\cdot$ 10$^{18}$ cm$^{-3}$ and completely remove the potential barrier, thereby reducing the series resistance of the device. The parameters of an GaInAs metamorphic buffer layer with a stepwise In content profile are calculated and its epitaxial growth conditions are optimized, which improves carrier collection from the $n$-GaInAs base region and provides a quantum efficiency of 83% at a wavelength of 1064 nm. Optimization of the metamorphic heterostructure of the photovoltaic converter results in that its conversion efficiency for laser light with a wavelength of 1064 nm is 38.5%.