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This article is cited in 4 scientific papers (total in 4 papers)
Manufacturing, processing, testing of materials and structures
Study of the structural and optical properties of GaP(N) layers synthesized by molecular-beam epitaxy on Si(100) 4$^\circ$ substrates
N. V. Kryzhanovskayaabc, Yu. S. Polubavkinaa, V. N. Nevedomskiyc, E. V. Nikitinaa, A. Lazarenkoa, A. Yu. Egorovd, M. V. Maksimovabc, È. I. Moiseeva, A. E. Zhukovab a Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
b Peter the Great St. Petersburg Polytechnic University
c Ioffe Institute, St. Petersburg
d St. Petersburg National Research University of Information Technologies, Mechanics and Optics
Abstract:
The structural and optical properties of GaP and GaPN layers synthesized by molecular-beam epitaxy on Si(100) substrates misoriented by 4$^\circ$ are studied. The possibility of producing GaP buffer layers that exhibit a high degree of heterointerface planarity and an outcropping dislocation density of no higher than $\sim$2 $\times$ 10$^{8}$ cm$^{-2}$ is shown. Emission from the Si/GaP/GaPN structure in the spectral range of 630–640 nm at room temperature is observed. Annealing during growth of the Si/GaP/GaPN structure makes it possible to enhance the room-temperature photoluminescence intensity by a factor of 2.6, with no shift of the maximum of the emission line.
Received: 26.07.2016 Accepted: 01.08.2016
Citation:
N. V. Kryzhanovskaya, Yu. S. Polubavkina, V. N. Nevedomskiy, E. V. Nikitina, A. Lazarenko, A. Yu. Egorov, M. V. Maksimov, È. I. Moiseev, A. E. Zhukov, “Study of the structural and optical properties of GaP(N) layers synthesized by molecular-beam epitaxy on Si(100) 4$^\circ$ substrates”, Fizika i Tekhnika Poluprovodnikov, 51:2 (2017), 276–280; Semiconductors, 51:2 (2017), 267–271
Linking options:
https://www.mathnet.ru/eng/phts6246 https://www.mathnet.ru/eng/phts/v51/i2/p276
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