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This article is cited in 5 scientific papers (total in 5 papers)
Semiconductor physics
AlN/GaN heterostructures for normally-off transistors
K. S. Zhuravlevab, T. V. Malina, V. G. Mansurova, O. E. Tereshchenkoab, K. K. Abgaryanc, D. L. Reviznikovc, V. E. Zemlyakovd, V. I. Egorkind, Ya. M. Parnese, V. G. Tikhomirove, I. P. Prosvirinf a Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
b Novosibirsk State University
c Dorodnicyn Computing Centre of the Russian Academy of Sciences, Moscow, Russia
d National Research University of Electronic Technology
e ZAO Svetlana-Elektronpribor, St. Petersburg
f Boreskov Institute of Catalysis SB RAS, Novosibirsk
Abstract:
The structure of AlN/GaN heterostructures with an ultrathin AlN barrier is calculated for normally-off transistors. The molecular-beam epitaxy technology of in situ passivated SiN/AlN/GaN heterostructures with a two-dimensional electron gas is developed. Normally-off transistors with a maximum current density of $\sim$1 A/mm, a saturation voltage of 1 V, a transconductance of 350 mS/mm, and a breakdown voltage of more than 60 V are demonstrated. Gate lag and drain lag effects are almost lacking in these transistors.
Received: 30.08.2016 Accepted: 05.09.2016
Citation:
K. S. Zhuravlev, T. V. Malin, V. G. Mansurov, O. E. Tereshchenko, K. K. Abgaryan, D. L. Reviznikov, V. E. Zemlyakov, V. I. Egorkin, Ya. M. Parnes, V. G. Tikhomirov, I. P. Prosvirin, “AlN/GaN heterostructures for normally-off transistors”, Fizika i Tekhnika Poluprovodnikov, 51:3 (2017), 395–402; Semiconductors, 51:3 (2017), 379–386
Linking options:
https://www.mathnet.ru/eng/phts6217 https://www.mathnet.ru/eng/phts/v51/i3/p395
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