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This article is cited in 12 scientific papers (total in 12 papers)
XV International Conference ''Thermoelectrics and Their Applications-2016 St. Petersburg'', November 15-16, 2016
Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching
E. V. Demidov, V. A. Komarov, A. N. Krushelnitckii, A. V. Suslov Herzen State Pedagogical University of Russia, St. Petersburg
Abstract:
A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
Received: 27.12.2016 Accepted: 12.01.2017
Citation:
E. V. Demidov, V. A. Komarov, A. N. Krushelnitckii, A. V. Suslov, “Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching”, Fizika i Tekhnika Poluprovodnikov, 51:7 (2017), 877–879; Semiconductors, 51:7 (2017), 840–842
Linking options:
https://www.mathnet.ru/eng/phts6088 https://www.mathnet.ru/eng/phts/v51/i7/p877
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Abstract page: | 39 | Full-text PDF : | 13 |
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